专利名称：METHOD OF MAKING AN ANTIREFLECTIVE
SILICA COATING, RESULTING PRODUCT,AND PHOTOVOLTAIC DEVICE COMPRISINGSAME
发明人：Pramod K. SHARMA申请号：US13670538申请日：20121107
公开号：US20130065064A1公开日：20130314
专利附图：
摘要：A low-index silica coating may be made by forming silica sol comprising a silane
and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glasssubstrate) to form a coating layer. The coating layer may then be cured and/or firedusing temperature(s) of from about 550 to 700° C. A capping layer composition
comprising an antifog composition including a siloxane and/or hydrofluororether may beformed, deposited on the coating layer, then cured and/or fired to form a capping layerThe capping layer improves the durability of the coating. The low-index silica basedcoating may be used as an antireflective (AR) film on a front glass substrate of aphotovoltaic device (e.g., solar cell) or any other suitable application in certain exampleinstances.
申请人：Guardian Industries Corp.
地址：Auburn Hills MI US
国籍：US
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