GAS SUPPLY DEVICE FOR A VACUUM PROCESSING CHAMBER,

专利名称：GAS SUPPLY DEVICE FOR A VACUUM

PROCESSING CHAMBER, METHOD OF GASSUPPLYING AND SWITCHING

发明人：Songlin XU,Tuqiang NI,Qiang WEI申请号：US14030405申请日：20130918

公开号：US20140083613A1公开日：20140327

专利附图：

摘要：The present disclosure provides a gas supply device used in vacuum processingchambers, which comprises: a first gas source and a second gas source; a first gas switch

in which its input is connected to the first gas source and its output can be switchablyconnected to the gas inlets of two vacuum processing chambers or two processingstations in one vacuum processing chamber; a second gas switch, in which its input isconnected to the second gas source and its output can be switchably connected to thegas inlets of the two vacuum processing chambers or the two processing stations; acontrol device for controlling the switching of the first gas switch and the second gasswitch, so as to make the first gas source and the second gas source complementarilyswitch between two vacuum processing chambers or two processing stations in onevacuum processing chamber. The present disclosure achieves complementary switchingof reactant gases in at least two vacuum processing chambers, which achieves full use ofreactant gases, saving the cost and improving work efficiency.

申请人：Songlin XU,Tuqiang NI,Qiang WEI

地址：Shanghai CN,Shanghai CN,Shanghai CN

国籍：CN,CN,CN

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