专利名称:Semiconductor device with copper wiring
connected to storage capacitor
发明人:Yukihiro Kumagai,Hideo Miura,Hiroyuki
Ohta,Tomio Iwasaki,Isamu Asano
申请号:US09525029申请日:20000314公开号:US06521932B1公开日:20030218
专利附图:
摘要:It is an object of the present invention to provide a high-reliability
semiconductor device having a storage capacitor and wiring using copper for a main
conductive film. Under the above object, the present invention provides a semiconductordevice comprising: a semiconductor substrate; a storage capacitor formed on the mainsurface side of the semiconductor substrate and being a first electrode and a secondelectrode arranged so as to put a capacitor insulation film; a wiring conductor formed onthe main surface side of the semiconductor substrate and including the copper (Cu)element; and a first film formed on the surface of the wiring conductor; wherein amaterial configuring the first film and a material configuring the first electrode and/orthe second electrode include the same element.
申请人:HITACHI, LTD.
代理机构:Antonelli, Terry, Stout & Kraus, LLP
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