Method Of Manufacturing Chemical Mechanical Polish

专利名称：Method Of Manufacturing Chemical

Mechanical Polishing Layers Having aWindow

发明人：Brian T. Cantrell,Kathleen McHugh,James T.

Murnane,George H. McClain,Durron A.Hutt,Robert A. Brady,Christopher A.Young,Jeffrey Borcherdt Miller

申请号：US13427408申请日：20120322

公开号：US20130247477A1公开日：20130926

专利附图：

摘要：A method of manufacturing polishing layers having a window for use in chemicalmechanical polishing pads is provided, wherein a plurality of polishing layers having anintegral window are derived from a cake, wherein the formation of density defects in thecake and the surface roughness of the polishing layers formed are minimized.

申请人：Brian T. Cantrell,Kathleen McHugh,James T. Murnane,George H.

McClain,Durron A. Hutt,Robert A. Brady,Christopher A. Young,Jeffrey Borcherdt Miller

地址：Port Deposit MD US,Newark DE US,Norristown PA US,Middletown DEUS,Wilmington DE US,Coatesville PA US,Newark DE US,West Chester PA US

国籍：US,US,US,US,US,US,US,US

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