Method for manufacturing polishing pad

专利名称：Method for manufacturing polishing pad发明人：Takeshi Fukuda,Tsuguo Watanabe,Junji

Hirose,Kenji Nakamura,Masato Doura

申请号：US13918341申请日：20130614公开号：US09050707B2公开日：20150609

专利附图：

摘要：A method for manufacturing a polishing pad, which may be laminated, with asmall number of manufacturing steps, high productivity and no peeling between apolishing layer and a cushion layer includes preparing a cell-dispersed urethane

composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material;laminating another face material on the cell-dispersed urethane composition; curing thecell-dispersed urethane composition, while controlling its thickness to be uniform, sothat a polishing layer including a polyurethane foam is formed; cutting the polishing layerparallel to the face into two pieces so that two long polishing layers each including thepolishing layer and the face material are simultaneously formed; and cutting the longpolishing layers to produce the polishing pad.

申请人：Takeshi Fukuda,Tsuguo Watanabe,Junji Hirose,Kenji Nakamura,Masato Doura

地址：Osaka JP,Osaka JP,Osaka JP,Osaka JP,Osaka JP

国籍：JP,JP,JP,JP,JP

代理机构：Morrison & Foerster LLP

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