System and methods for plasma application

专利名称：System and methods for plasma application发明人：Il-Hyo Koo,Cameron A. Moore,George J.

Collins,Jin-Hoon Cho

申请号：US12924404申请日：20100927

公开号：US20110101862A1公开日：20110505

专利附图：

摘要：The present disclosure provides for a plasma system. The plasma systemincludes a plasma device, an ionizable media source, and a power source. The plasmadevice includes an inner electrode and an outer electrode coaxially disposed around the

inner electrode. The inner electrode includes a distal portion and an insulative layer thatcovers at least a portion of the inner electrode. The ionizable media source is coupled tothe plasma device and is configured to supply ionizable media thereto. The power sourceis coupled to the inner and outer electrodes, and is configured to ignite the ionizablemedia at the plasma device to form a plasma effluent having an electron sheath layerabout the exposed distal portion.

申请人：Il-Hyo Koo,Cameron A. Moore,George J. Collins,Jin-Hoon Cho

地址：Fort Collins CO US,Loveland CO US,Fort Collins CO US,Fort Collins CO US

国籍：US,US,US,US

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